J. Phys. IV France 03 (1993) C3-611-C3-615
Structures and properties of Y-ZrO2 thin films deposited by reactive r.f. sputteringY.-H. WANG and X.-P. LI
Dept. Materials Science and Engineering Tsinghua University, Beijing 100084, China
The Y-ZrO2 thin films were deposited by r.f. magnetron sputtering method. The microstructure, phase composition and mechanical properties of the thin films were investigated. The studies show that the films had tiny grains, tetragonal phase, and the best properties when they were deposited at the condition of the low substrate temperature and zero oxygen partial pressure.
© EDP Sciences 1993