Numéro
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
Page(s) C3-557 - C3-562
DOI http://dx.doi.org/10.1051/jp4:1993377
Proceedings of the Ninth European Conference on Chemical Vapour Deposition

J. Phys. IV France 03 (1993) C3-557-C3-562

DOI: 10.1051/jp4:1993377

Chemical vapour deposition of Al2O3 on titanium oxides

E. FREDRIKSSON and J.-O. CARLSSON

Thin Film and Surface Chemistry Group, Institute of Chemistry, Uppsala University, Box 521, 751 21 Uppsala, Sweden


Abstract
The morphology of chemically vapour deposited α-Al2O3, developed on different titanium oxides, was studied. Ti2O3, Ti3O5 and TiO2 were used as substrate materials. The titanium oxides and the α-Al2O3, were grown by the TiCl4/H2/CO2, and the AlCl3/H2/CO2 processes, respectively, usually at 1000°C and 6.7×103 Pa. No considerable difference in morphology of α-Al2O3 on the different titanium oxides were obtained. The α-Al2O3 grains were larger on Ti2O3 than on Ti3O5 and TiO2.



© EDP Sciences 1993