Numéro
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
Page(s) C3-503 - C3-510
DOI http://dx.doi.org/10.1051/jp4:1993370
Proceedings of the Ninth European Conference on Chemical Vapour Deposition

J. Phys. IV France 03 (1993) C3-503-C3-510

DOI: 10.1051/jp4:1993370

Physical and tribological properties of a-Si1-xCx : H coatings prepared by r.f. plama-assisted chemical vapour deposition

J. SMEETS, J. MENEVE, R. JACOBS, L. EERSELS and E. DEKEMPENEER

Materials Division, Vlaamse Instelling voor Technologisch Onderzoek (VITO), Boeretang 200, 2400 Mol, Belgium


Abstract
a-Si1-xCx : H films deposited by r.f. plasma-assisted chemical vapour deposition were studied as a function of their composition. The friction and wear properties were investigated with the help of a conventional ball-on-disc apparatus. These results are correlated with chemical (Si/C atomic ratio) and structural (Raman and infrared spectroscopy) properties. The friction coefficient in a humid ambient atmosphere changes markedly with the carbon fraction and reaches a value as low as 0.05 for coatings with 70 to 90 at.% C. The carbon-rich films consist of diamond-like carbon with silicon.



© EDP Sciences 1993