Numéro
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
Page(s) C3-501 - C3-501
DOI http://dx.doi.org/10.1051/jp4:1993369
Proceedings of the Ninth European Conference on Chemical Vapour Deposition

J. Phys. IV France 03 (1993) C3-501-C3-501

DOI: 10.1051/jp4:1993369

Laser applications in CVD

M. STUKE

Max-Planck-Institut f. biophysikalische Chemie, Dept. Laserphysik, 3400 Göttingen, Germany


Abstract
With laser light of suitable wavelength and absorbed energy, spatial control and in-situ analysis of CVD processes can be achieved. Using UV photochemical decomposition of surface adsorbed precursors, patterned deposition of pure metal films with sub-µm accuracy can be done. This will be shown for Al as an example [1]. For the laser activated generation of free standing three-dimensional micro-objects, processes [2] with and without preformed substrate have been used and will be described. [1] F. Foulon, M.Stuke, Appl. Phys. A56(1993) 267-273 [2] O.Lehmann, M.Stuke, Appl.Phys. A53(1991)343-345



© EDP Sciences 1993