Numéro
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
Page(s) C3-485 - C3-491
DOI http://dx.doi.org/10.1051/jp4:1993367
Proceedings of the Ninth European Conference on Chemical Vapour Deposition

J. Phys. IV France 03 (1993) C3-485-C3-491

DOI: 10.1051/jp4:1993367

Deposition conditions for the growth of textured ZnO thin films by aerosol CVD process

J.-L. DESCHANVRES, B. BOCHU and J.-C. JOUBERT

Laboratoire des Matériaux et du Génie Physique, Ecole Nationale Supérieure de Physique de Grenoble, BP. 46, 38402 Saint-Martin d'Hères, France


Abstract
The crystalline orientation of ZnO thin films deposited by an aerosol CVD process is studied with regard to the experimental conditions. The quality of the C-axis oriented growth depended on the substrate temperature, on the deposition rate and also on the hygrometric degree of the carrier gas. The quality of the gold sublayer influenced also the quality of the ZnO textured growth. Under a dry gas mixture N2-O2 at 495°C and with a deposition rate of 35Å/mn, the texture ratio was less than -3.5 and the misorientation σ002 was less than 1.6°.



© EDP Sciences 1993