Numéro
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
Page(s) C3-217 - C3-224
DOI http://dx.doi.org/10.1051/jp4:1993329
Proceedings of the Ninth European Conference on Chemical Vapour Deposition

J. Phys. IV France 03 (1993) C3-217-C3-224

DOI: 10.1051/jp4:1993329

Structure and morphology of laser assisted chemical vapour deposited TiC coatings

M.L.F. PARAMÊS and O. CONDE

Department of Physics, Universiy of Lisbon, Campo Grande Ed. C1, 1700 Lisboa, Portugal


Abstract
Titanium carbide has been deposited on silica substrates by pyrolytic laser chemical vapour deposition (LCVD) using a cw CO2 laser and a reactive atmosphere consisting of TiCl4, CH4 and H2. The partial pressures of the gaseous components were kept constant in all the experiments at 7,21 and 130 torr, respectively, while the laser power density and the interaction time were varied in the ranges 90 - 190 W.cm-2 and 15 - 40 s. The films were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and stylus profilometry. In the range of the deposition parameters investigated, it is shown that preferentially (200) oriented films have been produced. From the profilometric analyses, an apparent activation energy of about 86 kJ / mole for the kinetics of film deposition has been deduced.



© EDP Sciences 1993