Numéro
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
Page(s) C3-177 - C3-182
DOI http://dx.doi.org/10.1051/jp4:1993322
Proceedings of the Ninth European Conference on Chemical Vapour Deposition

J. Phys. IV France 03 (1993) C3-177-C3-182

DOI: 10.1051/jp4:1993322

Texture analyses of chemically vapor deposited coatings in the Ti-C-N system by wide film Debye-Scherrer X-ray diffraction technique

S. EROGLU1 and B. GALLOIS2

1  TUBITAK, Marmara Research Center, Materials Research Division, P.O. Box 21, Gebze-Kocaeli, Turkey
2  Department of Materials Science and Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, U.S.A.


Abstract
Texture analyses were performed on the chemically vapor deposited monolithic TiN, TiC, TiCxNy coatings and graded TiN/TiC coatings by wide film Debye-Scherrer X-ray diffraction technique. The preferred orientations of the coatings were investigated as a function of coating thickness and input gas composition. The growth of TiN and TiC coatings was initiated as randomly oriented crystallites which subsequently grew into large columnar grains with a <110> preferred orientation. The textures of TiC coatings with the same thickness changed from the <110> orientation to the <100> orientation with decreasing hydrogen concentration in the gas phase. TiCxNy coatings exhibited a preferred orientation of <111> up to the CH4/CH4+N2 ratio of 0.14 above which a strong <100> texture developed. The texture analyses on the graded TiN/TiC coatings showed that the TiC top layers were oriented in a <100> direction perpendicular to the sample surface.



© EDP Sciences 1993