Numéro
J. Phys. IV France
Volume 01, Numéro C6, Décembre 1991
Beam Injection Assessment of Defects in Semiconductors
2nd International Workshop
Page(s) C6-51 - C6-56
DOI http://dx.doi.org/10.1051/jp4:1991609
Beam Injection Assessment of Defects in Semiconductors
2nd International Workshop

J. Phys. IV France 01 (1991) C6-51-C6-56

DOI: 10.1051/jp4:1991609

COMPUTER PROCESSING OF EBIC SIGNALS

O.V. KONONCHUK, N.G. USHAKOV, E.B. YAKIMOV and S.I. ZAITSEV

Institute of Microelectronics Technology and High Purity Materials, Academy of Sciences of the USSR, Chernogolovka, Moscow District 142432, USSR


Abstract
Some aspects of the use of computational methods are studied for quantitative EBIC measurements. It is investigated the problem of the determination of the bulk distribution of the diffusion length. Both parametric and nonparametric approaches are considered.



© EDP Sciences 1991