Numéro
J. Phys. IV France
Volume 01, Numéro C5, Décembre 1991
COLLOQUE WEYL VII
International Conference on METALS IN SOLUTION
Page(s) C5-71 - C5-76
DOI http://dx.doi.org/10.1051/jp4:1991508
COLLOQUE WEYL VII
International Conference on METALS IN SOLUTION

J. Phys. IV France 01 (1991) C5-71-C5-76

DOI: 10.1051/jp4:1991508

REFLECTANCE AND PHOTOEMISSION FROM Ag IN LIQUID NH3

H.-T. CHOU and J.C. THOMPSON

Department of Physics, University of Texas at Austin, Austin, TX 78712, U.S.A.


Abstract
We have made simultaneous observations of reflectance and photoyleid from Ag films in liquid NH3. Photoyleid is at the angle for surface plasmon excitation. The yield varies linearly with laser intensity. The results can be interpreted in terms of the classical Fresnel equations. The effective dielectric constant for NH3 is 1.95 instead of 1.75.



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