Numéro
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
Page(s) C2-617 - C2-624
DOI http://dx.doi.org/10.1051/jp4:1991274
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse

J. Phys. IV France 02 (1991) C2-617-C2-624

DOI: 10.1051/jp4:1991274

DEPOSITION OF BORON NITRIDE BY PLASMA ENHANCED CVD USING BORANE AMINE

J.G.M. BECHT1, A. BATH2, E. HENGST1, P.J. VAN DER PUT1 and J. SCHOONMAN1

1  Laboratory for Inorganic Chemistry, Delft University of Technology, Julianalaan 136, NL-2628 BL Delft, The Netherlands
2  C.L.O.E.S, E.S.S, University of Metz, 2 rue E. Balin, F-57078 Metz, France


Abstract
BN has been deposited with plasma enhanced CVD using borane dimethyl amine and NH3. The resulting layers are stable in air, although they contain an excess of boron, the actual amount depending on the deposition conditions. The presence of relatively large amounts of carbon in the layers indicates the incomplete decomposition of the organic fragment. Generally the layers posses the turbostratic structure. Only when a large excess of NH3 is present in the gas phase does the cubic structure develop.



© EDP Sciences 1991