Numéro
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
Page(s) C2-601 - C2-608
DOI http://dx.doi.org/10.1051/jp4:1991272
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse

J. Phys. IV France 02 (1991) C2-601-C2-608

DOI: 10.1051/jp4:1991272

ADHERENCE AND PROPERTIES OF SILICON CARBIDE BASED FILMS ON STEEL

M. LELOGEAIS1, M. DUCARROIR1 and R. BERJOAN2

1  CNRS-IMP, Université, 52 avenue de Villeneuve, F-66860 Perpignan cedex, France
2  CNRS-IMP, BP 5 Odeillo, F-66120 Font Romeu, France


Abstract
Coatings of silicon carbide with various compositions have been obtained in a r.f plasma assisted process using tetramethylsilane and argon as input gases. Some properties against mechanical applications of such deposits on steel have been investigated. Residual stresses and hardness are reported and discussed in relation with plasma parameters and deposit composition. By scratch testing, it was shown that the silicon carbide films on steel denote a good adherence when compared with previous data encoutered in the litterature for titanium carbide or nitride deposits though low critical load values. Adherence is discussed in relation to the nature of the interfacial zone examined hy Auger depth profiling. It is conclude that the films have promising variable properties which can be optimized by acting on plasma parameters.



© EDP Sciences 1991