Numéro
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
Page(s) C2-497 - C2-503
DOI http://dx.doi.org/10.1051/jp4:1991261
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse

J. Phys. IV France 02 (1991) C2-497-C2-503

DOI: 10.1051/jp4:1991261

PROPERTIES AND PRACTICAL RESULTS OF TUNGSTEN CARBIDE COATING PRODUCED BY LOW TEMPERATURE CVD PROCESS

S. ICHIJO1, K. TAMURA1, T. TAKANO1, A. NAKAO1 and T. HIRAHARA2

1  Tokyo Advanced Technologies CO., LTD., 5-3-38 Ujina-higashi, Minami-ku, Hiroshima 734, Japan
2  Tokyo Hard Coat CO., LTD., 1450-27 Aza-matsubara, Oaza-uenodai, Hukaya, Saitama 366, Japan


Abstract
In forming tungsten carbide layer by low temperature and vacuum CVD, uniformity of film thickness, adhesion and gloss achieved when the effective zone of coating set is increased to ∅450 × 1,100 mm is described. Characteristics of tungsten carbide layer are evaluated and compared with other materials. Some practical applications to the mechanical parts of plastic injection molding machines are introduced.



© EDP Sciences 1991