Numéro
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
Page(s) C2-397 - C2-404
DOI http://dx.doi.org/10.1051/jp4:1991248
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse

J. Phys. IV France 02 (1991) C2-397-C2-404

DOI: 10.1051/jp4:1991248

PLASMA ASSISTED CVD USING METALLO-ORGANIC COMPOUNDS AS PRECURSORS

K.-T. RIE, J. WÖHLE and A. GEBAUER

Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, TU Braunschweig, D-3300 Braunschweig, Germany


Abstract
In this work the use of three metallo-organic compounds was investigated with the pulsed DC plasma assisted CVD process to deposit layers on steel substrates and hard metals. The layers have been studied by SEM, XRD, WDX and ESCA. It is shown that chlorine free adhesive titanium carbonitride coatings can be obtained by MOCVD even at substrate temperatures less than 400 °C.



© EDP Sciences 1991