Numéro
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
Page(s) C2-111 - C2-118
DOI http://dx.doi.org/10.1051/jp4:1991213
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse

J. Phys. IV France 02 (1991) C2-111-C2-118

DOI: 10.1051/jp4:1991213

TRANSPORT PHENOMENA AND REACTOR DESIGN FOR CHROMIUM CARBIDE DEPOSITION

M. PONS1, M. SANCANDI2 and J.F. NOWAK3

1  Laboratoire S2MC, U.R.A. CNRS N° 413, ENSEEG, BP. 75, F-38402 Saint-Martin d'Hères, France
2  DT21, Chemin des Prèles, F-38240 Meylan, France
3  UNIREC, BP. 70, F-42702 Firminy, France


Abstract
In recent years, considerable effort has been devoted to the development of computer codes being able to simulate the CVD process. Improved modelling techniques and better understanding of reaction and transport phenomena during deposition are needed to bridge the gap between general knowledge and new process requirements. The general finite element code Flux Expert has been adapted to heat and mass transfer problems in CVD. With built in graphics and fully interactivity, a broad range of users may easily solve some of their CVD problems. Our aim in the example presented was to simulate the growth rate uniformity of chromium carbide coatings deposited inside a tube from organometallic precursors. We clearly show the influence of the injector geometry on the uniformity. Even if the chemistry of the examples discussed was simple, the agreement between experimental and theoretical values is rather good ; the two dimensional approximation of the hole bored injector seems also to be adequate to describe the geometry.



© EDP Sciences 1991