Numéro
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
Page(s) C2-897 - C2-901
DOI http://dx.doi.org/10.1051/jp4:19912107
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse

J. Phys. IV France 02 (1991) C2-897-C2-901

DOI: 10.1051/jp4:19912107

MICROENGINEERING - THE NEW APPLICATION OF CHEMICAL VAPOR DEPOSITION

P.B. GRABIEC and J.M. LYSKO

Inst. of Electron Technology, al. Lotnikow 32/46, 02-668 Warsaw, Poland


Abstract
Techniques of Chemical Vapour Deposition, developed primarily for VLSI Circuits fabrication, enriched by the experience of CVD methods utilized in the field of hard wear resistant coatings and other mechanical related application, are the versatile tools enabling creation of complex, 3-dimensional microstructures required for development of micromechanical devices - sensors and actuators. In this paper the application of CVD methods for fabrication of micromechanic and other transducers technologically microelectronic compatible is discussed. An example of capacitive pressure sensor which can be integrated with CMOS devices is presented.



© EDP Sciences 1991