J. Phys. IV France 02 (1991) C2-19-C2-31
THE MODELING OF LPCVD IN SINGLE-WAFER REACTORS AS A TOOL FOR PROCESS OPTIMIZATION AND EQUIPMENT DESIGNC.R. KLEIJN
Delft University of Technology, Faculty of Applied Physics, PO Box 5046, 2600 GA Delft, The Netherlands
An overview is given of the modeling of the hydrodynamics, transport phenomena and chemical reactions in single-wafer LPCVD reactors, both at the macroscopic (reactor-scale) and at the microscopic (feature-scale) level. Examples of modeling results for single-wafer silicon LPCVD from silane and tungsten LPCVD from tungsten hexafluoride and hydrogen are presented and comparisons are made with experimental results. The use of mathematical models in the design and optimization of single-wafer LPCVD reactors and processes is discussed.
© EDP Sciences 1991