Numéro
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
Page(s) C2-3 - C2-18
DOI http://dx.doi.org/10.1051/jp4:1991201
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse

J. Phys. IV France 02 (1991) C2-3-C2-18

DOI: 10.1051/jp4:1991201

NUMERICAL MODELLING OF CVD PROCESSES AND EQUIPMENT

C . WERNER

SIEMENS AG, ZFE SPT 33, Otto-Hahn-Ring 6, D-8000 Munich 83, Germany


Abstract
A review is given on actual numerical models for CVD equipment and processes. While the basic work concerning the differential equations and the boundary conditions has been established already a decade or more ago, the more recent availability of increased computing power has enabled simulation to become a predictive tool in equipment and process design. The present task in CVD simulation includes the stabilization of the numerical codes to achieve fast turnaround time and the improvement of transport and chemical models to proceed from qualitative studies to quantitative predictions. We will discuss models for heat and mass transport in low density gas mixtures and for homogeneous and heterogeneous reactions for a number of relevant CVD processes. Actual applications to problems in a submicron manufacturing environment will illustrate the presentation.



© EDP Sciences 1991