EDP Sciences Journals List
Issue J. Phys. IV France
Volume 104, March 2003
Page(s) 231 - 234
DOI http://dx.doi.org/10.1051/jp4:200300068



J. Phys. IV France
104 (2003) 231
DOI: 10.1051/jp4:200300068

Hard X-ray microscopy with reflecting mirrors status and perspectives of the ESRF technology

O. Hignette1, P. Cloetens1, W.-K. Lee1, W. Ludwig1 and G. Rostaing1

1  European Synchrotron Radiation Facility, BP. 220, 38043 Grenoble cedex, France


Abstract
Third génération synchrotron sources allow imaging at high energy with sub-micron resolution. The reflective optics Systems, with their high efficiency and achromatic nature are promising approaches towards that goal. The Kirkpatrick Baez (KB) technology, being developed at the ESRF, has achieved a measured spot size of $0.16 \times 0.21$ $\mu$m at 20.5 keV on the ID19 beamline. Despite non-perfect optics, nearly diffraction size has been achieved in one direction. Examples of projection full field and microfluorescence scanning imaging are reported. The expected performance of these Systems under coherent illumination and their applications are discussed in view of the progress achieved in optical manufacturing technology.



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